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KEYMACRO Description: ...View more(1) Field of the Invention The present invention relates to a system for producing a photomask and a method of producing a photomask. (2) Description of the Related Art There is a need for enhancing resolution of photomasks in lithography. In order to achieve this, it is necessary to reduce the wavelength of an exposure light source. At present, ArF excimer laser (193 nm) is being investigated as an exposure light source, and the use of extreme ultraviolet (EUV) light having a wavelength of approximately 13 nm is being examined as the next generation exposure light source. For the use of EUV light, much research is being conducted on a photomask made of a material with an enhanced transmittance to EUV light (see e.g., Patent Documents 1 to 3).TEXAS STARTER, Texas -- This story is developing. Check back for updates. 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